츮 żк 4г л SCI м Microelectronic Engineering ֽȣ Engineering TiOx interlayers in high vacuum for Al-contacted MoSe2 transistors' ߴ. ״忡 ϴ Microelectronic Engineering ݵü ̼ ڰ о , , , ȸ õ ϴ м̴.
ݵü ַ Ǹ ϴµ, Ǹ Ѱ踦 غϱ ݵü ῡ Ȱ ̷ ִ. ߿ Ư ̼ȭ굧(MoSe2) 2 ݵü ݵü, ÷, پ о߿ ִ ǰ ִ.
̹ л ǥ ݵü Ʈ ۿ ʿ ݼ ؿ ߴ. 2 ݵü Ʈʹ ݼ ַ , л ̼ȭ굧 ƮͿ Ǹ ݵü θ ϴ ˷̴ ϱ ̼ȭ굧 ˷̴ ̿ ŸŸ ߴ. ¿ ŸŸ ȭǾ ȭŸŸ(TiOx) Ǿ ϰ, Ʈ Ǿ.
̷ ̼ȭ굧 2 ݵü ǿȭ ũ ȴ. żк ֿ л ڼ Īϸ, 3г кο л ξ ڴٰ ߴ.
л кομ ̼ κе , п غϸ ϼ ־١ п Ͽ ؼ õ ݵü ϰ ʹ١ Ұ .