Journals
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Enhanced thickness uniformity of MoS2 thin films on SiO2/Si substrates via substrate pre-treatment with oxygen plasma | ||||
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관리자 | 작성일 |
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2024-07-16 15:04:31 | |
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| 이전글 | Low-temperature crystallization of BeO-assisted polycrystalline germanium layer ... | |
| 다음글 | Effect of deposition temperature on the electrical properties of solid-phase cry... | |
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