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Conferences

100.
 Optimization of Polycrystalline Ge Thin Films through Controlling Substrate Temperature during Evaporation
Y. Jo, D. Ahn, and W. Choi, presented by Y. Jo at Korea Materials Research Society Fall Meeting,Gyeongju, South Korea,November 16, 2023
99.
 Effects of Deposition Temperature and Substrate on the Electrical Properties of Evaporated Ge Thin Films
H. Kwon, D. Ahn, and W. Choi, presented by H. Kwon at Korea Materials Research Society Fall Meeting,Gyeongju, South Korea,November 16, 2023
98.
 Oxygen plasma pre-treatment of SiO2/Si substrates for enhanced thickness uniformity of MoS2 thin films
I. Lim, Y. Koo, and W. Choi, presented by I. Lim at Korea Materials Research Society Fall Meeting,Gyeongju, South Korea,November 16, 2023
97.
 Influence of Deposition Temperature on the Electrical Properties of Polycrystalline Germanium Thin Films
Y. Jo, H. Soh, D. Ahn, and W. Choi, presented by Y. Jo at Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD 2023),Yokohama, Japan,July 11, 2023
96.
 Effect of substrate materials on the solid-phase crystallized Ge thin films
H. Kwon, Y. Jo, H. Soh, D. Ahn, and W. Choi, presented by H. Kwon at Global Conference on Innovation Materials,Jeju, South Korea,June 9, 2023
95.
 Influence of Deposition Temperature on the Electrical Properties of Polycrystalline Germanium Thin Films
Y. Jo, H. Soh, D. Ahn, and W. Choi, presented by Y. Jo at Global Conference on Innovation Materials,Jeju, South Korea,June 9, 2023
94.
 O2 plasma treatment for enhancing thickness uniformity of chemical-vapor-deposited MoS¬2 thin films on SiO2 substrates
I. Lim and W. Choi, presented by I. Lim at Global Conference on Innovation Materials,Jeju, South Korea,June 7, 2023
93.
 Reducing Schottky barrier height at the MoSe2/Al interface with Ti interlayer
Y. Oh, Y. Jo, and W. Choi, presented by Y. Oh at Global Conference on Innovation Materials,Jeju, South Korea,June 7, 2023
92.
 Fabrication and characterization of vertical WSe2-MoS2 heterojunction p-n diodes
S. Choi, I. Lim, and W. Choi, presented by S. Choi at Global Conference on Innovation Materials,Jeju, South Korea,June 7, 2023
91.
 Effect of O2 plasma treatment on the thickness uniformity of chemical vapor deposited MoS2 thin films on SiO2 substrates
I. Lim and W. Choi, presented by I. Lim at Materials Research Society Spring Meeting,San Francisco, California,April 13, 2023


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