Journals
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Enhanced thickness uniformity of MoS2 thin films on SiO2/Si substrates via substrate pre-treatment with oxygen plasma | ||||
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관리자 | 작성일 |
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2024-01-22 16:31:37 | |
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| 이전글 | Engineering TiOx interlayers in high vacuum for Al-contacted MoSe2 transistors | |
| 다음글 | 다음글이 없습니다. | |
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